据劳伦斯利弗莫尔国家实验室的研究团队介绍，相比现有EUV光刻系统所采用的CO2激光器，BAT 激光器可以将 EUV能源效率提高约 10 倍。这可能会助力未来“beyond EUV”光刻系统能够生产更小、更强大、制造速度更快、耗电量更少的芯片。

1月6日消息，美国劳伦斯利弗莫尔国家实验室（LLNL）宣布开发出了一种名称为大孔径铥 （BAT） 激光器，旨在为极紫外 （EUV） 光刻技术的下一步发展奠定基础。该激光器的效率号称是目前ASML EUV光刻机中使用的二氧化碳（CO2）激光器的 10 ...

01 数年前，美国逼迫荷兰半导体巨头asml对华断供先进制程光刻机，引发我国半导体业界的忧虑。 02 中科院物理学教授朱士尧曾悲观地表示：“中国 ...

EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV ...

近日，一名具有俄罗斯背景的ASML前员工因涉嫌窃取ASML和Mapper Lithography 的微芯片手册等文件而被荷兰政府拘留，引发各方关注。 这位工程师曾是电子 ...

I got a rare look at the one tool responsible for all the tech in your life. It’s made by a company you’ve never heard of.

ASML is canceling orders for the $230 Lego kit version of its $380 million High-NA EUV machine coming from non-ASML employees, as X (formerly Twitter) user @jonmasters discovered. This limited-edition ...

Russia has unveiled a roadmap to develop its own lithography machines, aiming to create less costly and complex equipment than ASML's systems, according to CNews. These machines will use lasers ...