Today's most advanced 193 nm immersion lithography systems can resolve features down to 38 nm, owing to the use of optical tricks such as off-axis illumination and water immersion projection ...

Extreme UV lithography (EUVL) and 193 nm immersion lithography enhanced by double-patterning techniques will be sufficient to maintain the lithography roadmap for several technology nodes.

A photolithographic technique that beams light through ultra-pure water in order to focus more sharply and create smaller transistor features. See photolithography. THIS DEFINITION IS FOR PERSONAL ...

Advanced photolithography techniques, such as immersion lithography and extreme UV lithography (EUVL), can improve the resolution to sub-100 nm. The choice of materials, particularly the polymer and ...

Rapidus installing ASML's EUV lithography equipment at its Innovative Integration for Manufacturing (IIM-1) foundry.

ASML said the rule changes on Friday mean its TWINSCAN NXT:1970i and 1980i DUV immersion lithography systems will now require a license from the Dutch government to be exported. The Dutch ...

Under the new rules, companies would have to apply for licences to export technology including "the most advanced Deep Ultra Violet (DUV) immersion lithography and deposition". ASML said in a ...

produced a smartphone to rival Apple Inc.’s iPhone last year using top-of-the-line chips made with ASML’s immersion lithography machines, Bloomberg News has reported. Read More: China Secretly ...

Today, the US authorities published an updated version of the advanced computing and semiconductor manufacturing equipment rule, imposing additional restrictions on suppliers for the export of chip ...