Extreme UV lithography (EUVL) and 193 nm immersion lithography enhanced by double-patterning techniques will be sufficient to maintain the lithography roadmap for several technology nodes.

For many years, the industry has pushed this limit by using shorter wavelengths of light and immersion lithography, where a liquid is used between the lens and the wafer to increase the numerical ...

Beijing this month advised state-linked organizations to use a new homemade laser-based immersion lithography machine, whose specification marked a breakthrough in the development of domestic ...

ASML said the rule changes on Friday mean its TWINSCAN NXT:1970i and 1980i DUV immersion lithography systems will now require a license from the Dutch government to be exported. The Dutch ...

Advanced photolithography techniques, such as immersion lithography and extreme UV lithography (EUVL), can improve the resolution to sub-100 nm. The choice of materials, particularly the polymer and ...

Today, the US authorities published an updated version of the advanced computing and semiconductor manufacturing equipment rule, imposing additional restrictions on suppliers for the export of chip ...

John Warlaumont, vice president of advanced technologies at SEMATECH, a consortium of the world's chip manufacturers, talks to Nadya Anscombe about the future of optical lithography. Most ...

Under the new rules, companies would have to apply for licences to export technology including "the most advanced Deep Ultra Violet (DUV) immersion lithography and deposition". ASML said in a ...