The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more ...

Carbon nanotubes present a game-changing solution for preventing defects in EUV lithography, supporting the semiconductor ...

The project aims for the next evolution of EUV lithography, centered around the lab-developed driver system named the Big ...

Nvidia (NVDA) stock fell Friday along with other chipmakers after a December jobs report pushed out expectations for ...

ELMIC aims to advance the basic science driving the integration of new materials and processes into future microelectronic ...

ASML Holding dominates EUV lithography, key for AI and 5G. See why ASML stock remains a strong buy for long-term investors ...

The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by ...

据报道，美国劳伦斯利弗莫尔国家实验室正在研发一种拍瓦级（petawatt-class）铥激光器（thulium laser），据说其效率比 EUV 工具中使用的二氧化碳激光器高 10 倍，并且可以在未来许多年内取代光刻系统中的二氧化碳激光器。

Chinese tech firms entered a brave new world in 2020 as the US began restricting access to advanced semiconductor ...

ASML's pullback offers buying opportunity for long-term investors, with EUV lithography leadership and strong revenue ...

She has one of the most important jobs in the world, but most people outside of the Idaho factory where she works have never ...