A photolithographic technique that beams light through ultra-pure water in order to focus more sharply and create smaller transistor features. See photolithography. THIS DEFINITION IS FOR PERSONAL ...

Extreme UV lithography (EUVL) and 193 nm immersion lithography enhanced by double-patterning techniques will be sufficient to maintain the lithography roadmap for several technology nodes.

Advanced photolithography techniques, such as immersion lithography and extreme UV lithography (EUVL), can improve the resolution to sub-100 nm. The choice of materials, particularly the polymer and ...

ASML said the rule changes on Friday mean its TWINSCAN NXT:1970i and 1980i DUV immersion lithography systems will now require a license from the Dutch government to be exported. The Dutch ...

7, it will need to apply for export licenses with the Dutch government rather than the U.S. for shipments of its TWINSCAN NXT ...

John Warlaumont, vice president of advanced technologies at SEMATECH, a consortium of the world's chip manufacturers, talks to Nadya Anscombe about the future of optical lithography. Most ...

Under the new rules, companies would have to apply for licences to export technology including "the most advanced Deep Ultra Violet (DUV) immersion lithography and deposition". ASML said in a ...

They will affect exports ranging from tools which are used to clean silicon wafers to immersion lithography machines. Lithography machines use lasers to print miniscule patterns on silicon as part ...