Photolithography offers high precision, repeatability, and the ability to fabricate complex micro and nanostructures across large areas. However, it faces limitations such as diffraction and ...

In a breakthrough set to revolutionize the semiconductor industry, the School of Engineering of the Hong Kong University of ...

Conducted under the supervision of Prof. Kwok Hoi-Sing, Founding Director of the State Key Laboratory of Advanced Displays ...

The challenge faced by the semiconductor industry is that current photolithography tools are constrained to transfer patterns with feature sizes larger than the "diffraction limit" which is roughly ...

In a breakthrough set to revolutionize the semiconductor industry, engineers have developed the world's first-of-its-kind deep-ultraviolet (UVC) microLED display array for lithography machines. This ...

A team of engineers at the Hong Kong University of Science and Technology (HKUST) has made a groundbreaking invention in ...

The KLA Approach to IC Substrate Photolithography KLA's portfolio includes multiple direct imaging solutions, designed to address the lithography challenges of today and tomorrow.