Photolithography offers high precision, repeatability, and the ability to fabricate complex micro and nanostructures across large areas. However, it faces limitations such as diffraction and ...
The challenge faced by the semiconductor industry is that current photolithography tools are constrained to transfer patterns with feature sizes larger than the "diffraction limit" which is roughly ...
In a breakthrough set to revolutionize the semiconductor industry, engineers have developed the world's first-of-its-kind deep-ultraviolet (UVC) microLED display array for lithography machines. This ...
The KLA Approach to IC Substrate Photolithography KLA's portfolio includes multiple direct imaging solutions, designed to address the lithography challenges of today and tomorrow.