The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by ...

在半导体制造领域，极紫外光刻（EUV）技术一直是推动芯片制造先进工艺发展的关键。然而，当前的EUV光刻系统面临着能耗高、成本昂贵等问题。近日，美国劳伦斯利弗莫尔国家实验室（LLNL）宣布正在研发一种基于铥元素的拍瓦级（petawatt-class）铥 ...

美国劳伦斯利弗莫尔国家实验室(LLNL)正致力于研发一种革命性的激光器——拍瓦级(petawatt-class)铥激光器(thulium laser)，其效率远超传统的CO2 EUV激光器，高达10倍之多，为下一代EUV光刻技术的突破奠定了坚实基础。

如果下一代超数值孔径（Hyper-NA EUV）光刻技术上市，功耗可能会更高。因此，我们可以预期该行业将继续寻找更节能的技术来为未来的EUV光刻机提供动力，而LLNL的 BAT激光技术无疑为这一目标提供了新的可能性。

据报道，美国劳伦斯利弗莫尔国家实验室正在研发一种拍瓦级（petawatt-class）铥激光器（thulium laser），据说其效率比 EUV 工具中使用的二氧化碳激光器高 10 倍，并且可以在未来许多年内取代光刻系统中的二氧化碳激光器。

EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV ...

The project aims for the next evolution of EUV lithography, centered around the lab-developed driver system named the Big ...

ELMIC aims to advance the basic science driving the integration of new materials and processes into future microelectronic ...

In the case of the MIT project, a 1.9 μm thulium laser produces a beam tuned to water vapor at power levels that are not harmful to your eyes. The water vapor around your ears — and there is a ...

Less common, but still valuable, is thulium's role in doping a special type of garnet, yttrium aluminium garnet or YAG. The crystal is used as the active medium in a laser with a wavelength of around ...

Decades of cutting-edge laser, optics and plasma physics research at Lawrence Livermore National Laboratory (LLNL) played a key role in the underlying ...

The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more ...