The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more ...

The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by ...

EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV ...

ELMIC aims to advance the basic science driving the integration of new materials and processes into future microelectronic ...

The project aims for the next evolution of EUV lithography, centered around the lab-developed driver system named the Big ...

The UV excimer laser is one of the most precise industrial processing tools on the market and has many applications, of which eye surgery and semiconductor lithography are perhaps the best known.

Use precise geolocation data and actively scan device characteristics for identification. This is done to store and access ...

Decades of cutting-edge laser, optics and plasma physics research at Lawrence Livermore National Laboratory (LLNL) played a key role in the underlying ...

The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small ... It’s high-rigidity stage enables beam positioning resolution of 0.1nm. A laser ...

Their study is published in the journal Laser and Photonics Reviews ... such as imaging, semiconductor lithography, material science and medical therapies. Typically, such beams are derived ...