This platform gives TSMC the opportunity to take the next step forward in exploring multiple e-beam technology as a lithography option at 22 nanometer and more advanced process nodes. Multiple e-beam ...

Screen printing has quickly become one of the most common and effective ways to imprint designs and functional inks onto ...

As a leading semiconductor equipment manufacturer, its cutting-edge lithography ... simplifies the process. Multiple patterning, which involves multiple exposures and etching steps, increases ...

Fab tools are being fine-tuned for TSV processes as demand ramps for everything from HBM to integrated RF, power, and MEMS in ...

Various steps of IC fabrication like lithography ... Technology nodes are shrinking but the wave length and numerical aperture (NA) of the UV light used in photo lithography process is still a major ...

many have started thinking about the next step. The first decade following the introduction of high-volume EUV lithography is expected to involve optimization of the process, reaching feature ...

Arizona State University was awarded the third National Semiconductor Technology Center lab in the United States, complementing the $825 million chip-patterning lab awarded to Albany NanoTech in ...

Both Applied Materials and ASML supply critical equipment for AI microchip manufacturing. Applied Materials enjoyed five ...

A team of engineers at the Hong Kong University of Science and Technology (HKUST) has made a groundbreaking invention in ...

A team from Hong Kong University of Science and Technology (HKUST) has developed a deep-ultraviolet (UVC) microLED display ...

the lithography-aware steps like mask data preparation, optical proximity correction (OPC), and resolution enhancement techniques (RET) would need to be recalibrated or updated with new process ...

KLA's portfolio means it is primed to capitalize on market trends in 2025 like AI and advanced packaging. Learn why KLAC ...