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来自MSN
15 小时
远超EUV光刻技术!由美国研发的新一代激光器要来了!
美国劳伦斯利弗莫尔国家实验室(LLNL)正致力于研发一种革命性的激光器——拍瓦级(petawatt-class)铥激光器(thulium laser),其效率远超传统的CO2 EUV激光器,高达10倍之多,为下一代EUV光刻技术的突破奠定了坚实基础。
19 小时
on MSN
美国开发新一代BAT激光器:远超现有EUV光刻 效率提升10倍!
快科技1月6日消息,美国劳伦斯利弗莫尔国家实验室(LLNL)正在研究一种效率比传统CO2 EUV激光器高10倍的激光器,这将为下一代EUV光刻技术发展奠定基础。
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