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American lab is developing a BAT laser that could enable 'beyond EUV' lithography, provide 10X power efficiency boost
The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by ...
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LLNL develops next-generation ultraviolet lithography platform
ELMIC aims to advance the basic science driving the integration of new materials and processes into future microelectronic ...
American lab is developing a BAT laser that could enable 'beyond EUV' lithography
The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more ...